Modelling the processes of micro-defects nucleation in thin-film interconnects of integrated circuits at electromigration

Digital Repository, ICF10, Honolulu (USA) 2001

R. V. Goldstein, M. E. Sarychev, D. B. Shirabaikin, A. S. Vladimirov, Y. V. Zhitnikov

Last modified: 2013-04-03

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